Method for manufacturing an ophthalmic lens

ABSTRACT

A method for manufacturing an ophthalmic lens including selecting a base of polymeric material and applying a multiple layer structure coating. The coating is selected by designating an interphase, a first layer (of 91-169 nm) with a refraction index higher than 1.8, a second layer (of 128-248 nm) with a refraction index lower than 1.65, a third layer (of 73-159 nm) with a refraction index higher than 1.8 and a fourth layer (of 40-138 nm) with a refraction index lower than 1.8. A total thickness of the multiple layer structure is less than 600 nm. The structure has intermediate layer(s) with intermediate refraction indices, wherein a doublet of two adjacent layers that fulfil the thicknesses above is replaced by a triplet so that the thickness and an optical thickness of the triplet differ from those of the doublet by less than 5%, respectively.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional of U.S. patent application Ser. No.14/553,428, filed Nov. 25, 2014, which claims the foreign prioritybenefit of Spanish Patent Application No. P201331729 filed Nov. 27,2013, the contents of which are incorporated herein by reference.

DESCRIPTION Field of the Invention

The invention relates to a method for manufacturing an ophthalmic lenshaving a base of polymeric material with a coating having aninterferential multiple layer structure.

Background

The technology of multiple layer structures is known for creatinginterferential effects on optical surfaces.

In the field of ophthalmic lenses, it is usual to use interferentialmultiple layer structures to create anti-reflective or reflectivesurfaces of different intensities and residual colors, usuallyanti-reflective of green color with visible light reflection percentageslower than 2.5%, or even lower than 1.5% for each surface including amultiple layer structure.

Also known is the use of treatments for filtering a percentage of theIRA (infra-red A) or blue radiation selectively. However, the IR lightfiltering requires complex solutions that are not easily applicable totransparent lenses without coloring. In particular, layers of metals canbe applied that absorb or help to reflect part of the IRA radiation butthese materials absorb at the same time visible light, and so they donot enable obtaining high visible transmittance lenses with thesefeatures.

Interferential filters exist (for example the ones of the heat mirrortype) that are used in applications for precision optics on a minerallens, and they enable reducing the IRA radiation transmittance whilemaintaining a high visible transmittance: these filters have a multiplelayer structure with between 40 and 100 layers and they have a totalthickness over 1000 nm (nanometers), These filters are designedspecifically for a certain angle of incidence of the incident radiation,and therefore if the angle varies, they display the typical effects ofiridescence. Also, these treatments usually have a slight residualcoloring which, in comparison with the anti-reflective lenses, makesthem rather unattractive in aesthetic terms.

SUMMARY OF THE INVENTION

An object of the invention is to overcome these drawbacks. This purposeis achieved by means of an ophthalmic lens of the type indicated at thebeginning wherein the multiple layer structure includes:

an interphase, orientated towards the base, of a material from the groupmade up of SiO_(x), SiO₂, Cr, Ni/Cr, SnO₂, Al₂O₃, AlN, ZnO, SiO/Cr,SiO_(x)/Al₂O₃, ITO, MoO₃, with a thickness between 0 and 150 nm,preferably between 5 and 25 nm

a first high refraction index layer, of a material from the group madeup of oxides, nitrides or oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hfand mixtures thereof, with a refraction index n_(D) higher than 1.8,

a second low refraction index layer, of a material from the group madeup of SiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof, with a refractionindex n_(D) lower than 1.65,

a third high refraction index layer made of a material from the groupmade up of oxides, nitrides or oxynitrides Zr, Ti, Sb, In, Sn, Ta, Nb,Hf and mixtures thereof, with a refraction index n_(D) higher than 1.8,

a fourth layer, made of a material from the group made up of SiO₂, MgF₂,Al₂O₃, LaF₃ and mixtures thereof, with a refraction index n_(D) lowerthan 1.8,

where between the interphase and the first high refraction index layerthere is a first intermediate layer 7 (FIG. 2) with a refraction indexn_(D) lower than 1.8 and with a thickness of between 0 and 160 nm,where between the first high refraction index layer and the second lowrefraction index layer there is a second intermediate layer 6 (FIG. 2)with a refraction index n_(D) between 1.65 and 1.8 and with a thicknessof between 0 and 100 nm,where between the second low refraction index layer and the third highrefraction index layer there is a third intermediate layer 5 (FIG. 2)with a refraction index n_(D) between 1.65 and 1.8 and with a thicknessbetween 0 and 110 nm,where the total thickness of the multiple layer structure is at the most600 nm, measured from the start of the interphase to the end of thefourth layer, andwhere, if there is none of said intermediate layers, the thickness ofsaid first high refraction index layer is between 91 and 169 nm,preferably between 101 and 159 nm, the thickness of said second lowrefraction index layer is between 128 and 248 nm, preferably between 138and 240 nm, the thickness of said third high refraction index layer isbetween 73 and 159 nm, preferably between 83 and 147 nm, and thethickness of said fourth layer is between 40 and 138 nm,and, if there is one of said intermediate layers, it holds that:

the doublet made up of the first high refraction index layer and thesecond low refraction index layer that fulfil said thicknesses isreplaced by a triplet made up of a first intermediate layer, a firsthigh refraction index layer and a second low refraction index layer suchthat the thickness of said triplet differs from the thickness of saiddoublet by less than 5%, and such that the optical thickness of saidtriplet differs from the optical thickness of said doublet by less than5%,

and/or

the doublet made up of the first high refraction index layer and thesecond low refraction index layer which fulfil said thicknesses isreplaced by a triplet made up of a first high refraction index layer, asecond intermediate layer and a second low refraction index layer suchthat the thickness of said triplet differs from the thickness of saiddoublet by less than 5%, and such that the optical thickness of saidtriplet differs from the optical thickness of said doublet by less than5%,

and/or

the doublet made up of the second low refraction index layer and thethird high refraction index layer which fulfil said thicknesses isreplaced by a triplet made up of a second low refraction index layer, athird intermediate layer and a third high refraction index layer suchthat the thickness of said triplet differs from the thickness of saiddoublet by less than 5%, and such that the optical thickness of saidtriplet differs from the optical thickness of said doublet by less than5%.

In fact, this way a multiple layer structure is obtained that reflects asignificant percentage of infra-red radiation while it maintains theanti-reflective properties in the visible, with a limited angulardispersion in the residual reflection, by adapting standardanti-reflective filter technology.

Multiple layers exist in the market for ophthalmic products, which areanti-reflective, with an infra-red filter or which limit the angulardispersion in the residual reflection, but there is no solution thatgroups together these four characteristics in one and the same treatmentwith a total thickness of less than 600 nm. This is due to the fact thateach of the desired effects is achieved by including a group of layersspecifically designed to fulfil the specific function in question(anti-reflective, IR filter or angular dispersion limiter in theresidual reflection). This way, the total of the multiple layerstructure has a plurality of layers and a high thickness. This highthickness produces secondary mechanical effects (residual stress,cracking, delamination) which, although they are maintained withinacceptable values in the case of mineral precision optics lenses, theyare not acceptable in the case of ophthalmic organic based lenses. Evenif the amount of filtered IRA light is reduced, you still need a highoverall thickness to maintain some standard anti-reflectivecharacteristics in the visible spectrum of the ophthalmic sector.

However, it has been discovered that there is a very specific subset ofthicknesses of interferential multiple layers, with an overall thicknessless than 600 nm, which allows obtaining at the same time ananti-reflective treatment in the visible with low angular dispersion inthe residual reflection (a visible reflection less than 5% for anincident angle of 60°, preferably less than 4%), and partiallyreflecting the IR-A light (an average transmission of between 780 and1400 nm less than 76%, preferably less than 70%). The singularity ofthis subset of treatment layer thicknesses is revealed because whenvarying the thickness of each layer within a relatively small range, andwithout exceeding 600 nm total, some of the three desired requirementsare not fulfilled.

The ranges of thicknesses that include the value “0” (for example, “from0 to 150 nm” mean that the layer in question is optional (the value “0”is equivalent to saying that said layer is not present).

Preferably, in the event that there is none of the intermediate layers,the thickness x of the first high refraction index layer, the thicknessy of the second low refraction index layer, the thickness z of the thirdhigh refraction index layer and the thickness t of the fourth layerfulfil the following relation:

${\left( {x\mspace{14mu} y\mspace{14mu} z\mspace{14mu} t} \right) - {\left( {129.5\mspace{14mu} 188.3\mspace{14mu} 116.0\mspace{14mu} 89.0} \right) \cdot A \cdot \begin{pmatrix}{x - 129.5} \\{y - 188.3} \\{z - 116.0} \\{t - 89.0}\end{pmatrix}}} \leq 1$ where $A = \begin{pmatrix}{8.29 \cdot 10^{4}} & {{{- 1.76} \cdot 10^{- 4}},} & {{- 1.18} \cdot 10^{- 4}} & {1.50 \cdot 10^{- 4}} \\{{- 1.76} \cdot 10^{- 4}} & {3.34 \cdot 10^{- 4}} & {{- 1.80} \cdot 10^{- 5}} & {{- 3.50} \cdot 10^{- 5}} \\{{- 1.18} \cdot 10^{- 4}} & {{- 1.80} \cdot 10^{- 5}} & {7.16 \cdot 10^{- 4}} & {{- 2.60} \cdot 10^{- 4}} \\{1.50 \cdot 10^{- 4}} & {{- 3.50} \cdot 10^{- 5}} & {{- 2.60} \cdot 10^{- 4}} & {5.34 \cdot 10^{- 4}}\end{pmatrix}$

and, if there is one of the intermediate layers, it holds that:

the doublet made up of the first high refraction index layer and thesecond low refraction index layer that that fulfil the relation above isreplaced by a triplet made up of a first intermediate layer, a firsthigh refraction index layer and a second low refraction index layer suchthat the thickness of said triplet differs from the thickness of saiddoublet by less than 5%, and such that the optical thickness of saidtriplet differs from the optical thickness of said doublet by less than5%,

and/or

the doublet made up of the first high refraction index layer and thesecond low refraction index layer which fulfil the relation above isreplaced by a triplet made up of a first high refraction index layer, asecond intermediate layer and a second low refraction index layer suchthat the thickness of said triplet differs from the thickness of saiddoublet by less than 5%, and such that the optical thickness of saidtriplet differs from the optical thickness of said doublet by less than5%,

and/or

the doublet made up of the second low refraction index layer and thethird high refraction index layer which fulfil the relation above isreplaced by a triplet made up of a second low refraction index layer, athird intermediate layer and a third high refraction index layer suchthat the thickness of said triplet differs from the thickness of saiddoublet by less than 5%, and such that the optical thickness of saidtriplet differs from the optical thickness of said doublet by less than5%.

Advantageously the thickness x of the first high refraction index layer,the thickness y of the second low refraction index layer, the thicknessz of the third high refraction index layer and the thickness t of thefourth layer fulfil the following relation:

${\left( {x\mspace{14mu} y\mspace{14mu} z\mspace{14mu} t} \right) - {\left( {129.7\mspace{14mu} 189.7\mspace{14mu} 114.2\mspace{14mu} 87.2} \right) \cdot A \cdot \begin{pmatrix}{x - 129.7} \\{y - 189.7} \\{z - 114.2} \\{t - 87.2}\end{pmatrix}}} \leq 1$ where $A = \begin{pmatrix}{1.53 \cdot 10^{- 3}} & {{- 3.41} \cdot 10^{- 4}} & {{- 1.35} \cdot 10^{- 4}} & {8.99 \cdot 10^{- 5}} \\{{- 3.41} \cdot 10^{- 4}} & 4.82^{- 4} & {{- 1.86} \cdot 10^{- 5}} & {9.77 \cdot 10^{- 6}} \\{{- 1.35} \cdot 10^{- 4}} & {{- 1.86} \cdot 10^{- 5}} & {1.12 \cdot 10^{- 3}} & {{- 2.53} \cdot 10^{- 4}} \\{8.99 \cdot 10^{- 5}} & {9.77 \cdot 10^{- 6}} & {{- 2.53} \cdot 10^{- 4}} & {8.44 \cdot 10^{- 4}}\end{pmatrix}$

and, if there are some of the intermediate layers, preferably theyfulfil the same relations above.

Preferably a simulation of the reflection and transmission curves of themultiple layer structure has the following characteristics:

a visible reflection by a light incidence angle of 15° lower than 2.5%,preferably lower than 1.5%; calculated as an average of the reflectionvalue in the range 380-780 nm, weighted by the spectral light efficiencyspectrum for day light and by the spectral distribution of the lightingD65, according to Spanish standard UNI-EN ISO 13666:1998,

a visible reflection R_(vis) by a light incidence angle of 60° lowerthan 5.0%, preferably lower than 4.5%; calculated as in the case above,and

a transmission value in infra-red A T_(IR-A) lower than 76%, preferablylower than 70%; calculated as an average transmission value in the range780-1400 nm according to the following formula:

$T_{{IR} - A} = {\sum\limits_{\lambda \in A}\frac{T(\lambda)}{14}}$where  A = {780, 800, 850, 900, 950, 1000, 1050, 1100, 1150, 1200, 1250, 1300, 1350, 1400}

In fact, the combination of these three properties within the rangesindicted makes it possible to obtain lenses with optimum results. Theparameters indicated are usual in the state of the art, are clearlydetermined and they can be obtained in a reliable manner by followingthe specified standards, that include some procedures for determiningthe values of the parameters in question in an objective manner andcommon to the state of the art.

Advantageously a simulation of the reflection and transmission curves ofthe multiple layer structure has a blue light transmittance valueT_(azul) lower than 95%, preferably lower than 92%; calculated as theaverage transmission value in the range 410-460 nm according to thefollowing formula:

$T_{azul} = {\sum\limits_{\lambda \in B}\frac{T(\lambda)}{6}}$where  B = {410, 420, 430, 440, 450, 460}

In fact, an additional advantage is that a suitable definition of eachof the layers in the multiple layer structures also allows fulfilling anadditional result, which is that the (little) visible light reflected isconcentrated in the blue-violet spectrum. This way the lens offersadditional protection to the user, reducing the amount of blue lightthat reaches the user's eye.

Preferably the coating includes a layer of anti-scratching lacquerbetween the multiple layer structure and the base.

Advantageously the lens has a multiple layer structure both on the innersurface and on the outer surface of the lens. In fact, this way it ispossible to noticeably increase the effect of the IRA radiationfiltered, with an improvement also in the transmittance in visiblelight.

Preferably the first high refraction index layer and/or the third highrefraction index layer have a refraction index n_(D) higher than 1.95.

Preferably the second low refraction index layer has a refraction indexn_(D) lower than 1.5.

Advantageously the fourth layer has a refraction index n_(D) lower than1.65.

Preferably the fourth layer has a refraction index n_(D) between 1.4 and1.6 and a thickness between 50 and 124 nm.

Advantageously the first intermediate layer has a thickness between 0and 25 nm.

Advantageously the first high refraction index layer and/or the thirdhigh refraction index layer is made up of two high refraction indexsub-layers, preferably by a first sub-layer of TiO₂ and a secondsub-layer of ZrO₂ or vice versa. In fact, the ZrO₂ has a highevaporation temperature and, as a layer of considerable thickness, cancause cracking problems due to residual stress. An alternative would beto completely replace this layer of ZrO₂ with a layer of TiO₂, which hasa lower evaporation temperature. However, this layer of TiO₂ is lesshard, therefore is scratches more easily. The solution proposed allowscombining the advantages in both cases. Generally, in this specificationand claims it must be understood that, when a layer is defined byindicating that the materials can be “a mixture of the above”, thisincludes not only the case where a layer includes a more or lesshomogenous mixture of said materials, but also the case where the layeris divided into sub-layers, each one of them made of one of saidmaterials. The specific case of the two sub-layers of TiO₂ and ZrO₂ isan example of this. So, another advantageous solution example is whenthe second low refraction index layer and/or the fourth layer are madeup of two low refraction index sub-layers, preferably by a firstsub-layer of SiO₂ and a second sub-layer of Al₂O₃ or vice versa.

Advantageously on the fourth layer there is a hydrophobic outer layer.

The lenses can be both sun lenses (absorbent in the visible spectrum)and substantially transparent lenses in the visible spectrum (indoorlenses).

The application of these layers is usually done using PVD (PhysicalVapor Deposition) techniques through evaporation with electron guns orthermal evaporation, although other techniques exist like Plasmaenhanced Chemical Vapor Deposition (PeCVD) or the reactive Sputteringwith which it is also possible to obtain this type of interferentiallayers.

A particularly advantageous embodiment of the invention is obtained whenthe multiple layer structure includes:

an interphase with a thickness between 15 and 45 nm, preferably of SiO₂,

a first high refraction index layer with a thickness between 123 and 145nm, preferably of TiO₂,

a second low refraction index layer with a thickness between 170 and 217nm, preferably of SiO₂,

a third high refraction index layer, divided into a first sub-layer witha thickness between 59 and 67 nm, preferably of TiO₂, and a secondsub-layer with a thickness between 50 and 74 nm, preferably of ZrO₂,

a fourth layer with a thickness between 44 and 68 nm, preferably ofSiO₂.

BRIEF DESCRIPTION OF THE DRAWINGS

Other advantages and characteristics of the invention are appreciatedfrom the following description, where, in a non-limiting manner, somepreferable embodiments of the invention are explained, with reference tothe accompanying drawings. The figures show:

FIG. 1, a diagrammatic view of a cross section of an embodiment of alens with a coating according to the invention.

FIG. 2, a diagrammatic view of a cross section of a multiple layerstructure according to the invention.

FIGS. 3 to 15, graph showing the reflection (in %) according to the wavelength (λ, in nm) of the incident radiation for the lenses in therespective examples.

DETAILED DESCRIPTION

FIG. 1 shows a general structure example of a lens according to theinvention. The lens includes a base P of polymeric material on whichthere is a primer layer IM, which is optional and which usually has athickness between 0.3 and 1.5 microns. Next there is a hardening layer E(usually with a thickness between 1 and 4 microns) on which the multiplelayer structure M according to the invention is arranged. This multiplelayer structure M is made up of a plurality of layers, which will bedetailed later. The last layer of the structure is a hydrophobic layerH, with a thickness between 3 and 25 nm. Generally this structure canexist on the two lens surfaces or only on one of them. If present on oneof them, any other conventional coating can be applied to the oppositesurface.

FIG. 2 shows diagrammatically a multiple layer structure M according tothe invention in greater detail.

The multiple layer structure M includes an interface IN (which isoptional) of metallic material or metallic oxide, with scarcerepercussion in the optical properties but critical for the mechanicalproperties, particularly those regarding adherence and wear, and abarrier against oxidation and diffusion. Preferably the material is oneof the group made up of SiO_(x), SiO₂, Cr, Ni/Cr, SnO₂, Al₂O₃, AlN, ZnO,SiO/Cr, SiO_(x)/Al₂O₃, ITO and MoO₃.

Next there is a first high refraction index layer 1A of metallic oxide,metallic nitride or metallic oxynitride with a refraction indexn_(D)>1.8 (preferably >1.95) necessary for adjusting the opticalproperties and essential for obtaining mechanical properties resistantto scratching. It is the first high refraction index layer 1A.Preferably it is made of a material from the group made up of oxides,nitrides or oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixturesthereof.

The following layer is made of a metallic oxide or fluoride with arefraction index n_(D)<1.65 (preferably <1.5) necessary for adjustingthe optical properties and essential for obtaining the mechanicalproperties resistant to scratching. It forms the second low refractionindex layer 2B. Preferably it is made of a material from the group madeup of SiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof.

On the second low refraction index layer 2B there is a third highrefraction index layer 3A, made of metallic oxide, metallic nitride ormetallic oxynitride with a refraction index n_(D)>1.8(preferably >1.95). Preferably it is made of a material from the groupmade up of oxides, nitrides or oxynitrides of Zr, Ti, Sb, In, Sn, Ta,Nb, Hf and mixtures thereof.

On the third high refraction layer 3A there is a layer of metallic oxideor fluoride with a refraction index n_(D)<1.8 (preferably <1.65). It isthe fourth layer 4. Preferably it is made of a material from the groupmade up of SiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof.

The total thickness of the multiple layer structure is less than 600 nm,measured from the start of the interphase to the end of the fourthlayer, and preferably it is less than 500 nm.

The simulation of the reflection and transmission curves of the multiplelayers is achieved using the transfer matrix method, introduced by F.Abelès (F. Abelès, J. Phys. Radium 11, 307 (1950)) and described in thestate of the art (for example in H. A. Macleod, Thin-Film OpticalFilters, 4^(th) Edition, CRC Press (2010)). It is the method applied bymost of the commercial programs (see, for example, FilmStar™(www.ftgsoftware.com) or Essential Macleod (www.thinfilmcenter.com)) onthe simulation of the reflection of multiple layers, and it is usedknowing the dispersion of the complex refraction indices of thematerials in each layer and the substrate, in the range of 380-1400 nm,the thicknesses of each layer and the incidence angle of the lightradiation.

Methods of Analyzing a Lens with a Coating According to the Invention

The analyses required to analyze a lens according to the invention canbe, for example:

-   -   Optical properties: optical transmittance and reflection spectra        from 200 to 3000 nm. The reference standard will be EN1836    -   Layer thickness and composition: ESCA (Electron Spectroscopy for        Chemical Analysis), XPS (X-ray Photoelectron Spectroscopy),        Electron Microscopy, SIMS (Secondary Ion Mass Spectroscopy).

EXAMPLES

Below are shown a series of examples wherein, in each case, thecomposition and thickness of the layer is indicated and the opticalproperties obtained.

Example 1: Minimizing the Reflection of Visible Radiation

Layer 4 SiO₂ - 81.2 nm Layer 3A TiO2 - 101.8 nm Layer 2B SiO2 - 169.9 nmLayer 1A TiO2 - 120.8 nm Base Polymer n_(D) = 1.6 RV 15°  0.5% RV 60° 5.0% T IR-A 71.8% Total thickness 437.7 nm

FIG. 3 shows a graph showing the reflection (in %) according to the wavelength (λ, in nm) of the incident radiation.

Example 2: Minimizing the Transmission of IR-A Radiation

Layer 4 SiO₂ - 61.4 nm Layer 3A TiO₂ - 107.6 nm Layer 2B SiO₂ - 169.0 nmLayer 1A TiO₂ - 126.0 nm Base Polymer n_(D) = 1.6 RV 15°  1.5% RV 60° 5.0% T IR-A 69.7% Total thickness 463.9 nm

FIG. 4 shows a graph showing the reflection (in %) according to the wavelength (λ, in nm) of the incident radiation.

Example 3: Minimizing the Reflection of Radiation at 60°

Layer 4 SiO₂ - 98.0 nm Layer 3A TiO₂ - 117.7 nm Layer 28 SiO₂ - 202.3 nmLayer 1A TiO₂ - 129.9 nm Base Polymer n_(D) = 1.6 RV 15°  1.5% RV 60° 3.0% T IR-A 75.3% Total thickness 547.8 nm

FIG. 5 shows a graph showing the reflection (in %) according to the wavelength (λ, in nm) of the incident radiation.

Example 4: Minimizing the Transmission of Blue Light

Layer 4 SiO₂ - 70.6 nm Layer 3A TiO₂ - 121.7 nm Layer 2B SiO₂ - 226.0 nmLayer 1A TiO₂ - 140.1 nm Base Polymer n_(D) = 1.6 RV 15°  1.5% RV 60° 4.4% T IR-A 74.3% Total thickness 558.2 nm

FIG. 6 shows a graph showing the reflection (in %) according to the wavelength (λ, in nm) of the incident radiation.

A 70.6% transmission of blue light is obtained.

Example 5: Minimizing the Reflection of Visible Radiation

In this Example other materials have been used to produce the layers inthe multiple layer structure.

Layer 4 MgF₂ - 77.1 nm Layer 3A ZrO₂ - 115.8 nm Layer 2B MgF₂ - 189.7 nmLayer 1A ZrO₂ - 141.0 nm Base Polymer n_(D) = 1.6 RV 15°  0.4% RV 60° 5.0% T IR-A 76.0% Total thickness 523.7 nm

FIG. 7 shows a graph showing the reflection (in %) according to the wavelength (λ, in nm) of the incident radiation.

Example 6: Residual Reflection Concentrated in Green

Layer 4 SiO₂ - 100.9 nm Layer 3A TiO₂ - 118.5 nm Layer 2B SiO₂ - 188.3nm Layer 1A TiO₂ - 116.9 nm Base Polymer n_(D) = 1.6 RV 15°  1.5% RV 60° 3.8% T IR-A 75.0% Total thickness 524.6 nm

FIG. 8 shows a graph showing the reflection (in %) according to the wavelength (λ, in nm) of the incident radiation.

Example 7: Solution According to the State of the Art

In this Example the solution that would have been obtained from theknowledge of the state of the art has been reproduced.

Layer 6 SiO₂ - 73.0 nm Layer 5 TiO₂ - 103.3 nm Layer 4 SiO₂ - 158.6 nmLayer 3 TiO₂ - 100.1 nm Layer 2 SiO₂ - 169.2 nm Layer 1 TiO₂ - 113.2 nmBase Polymer n_(D) = 1.6 RV 15°  1.2% RV 60°  6.2% T IR-A 67.1% Totalthickness 717.4 nm

As you can see, more layers are used and the thickness is greater than600 nm.

FIG. 9 shows a graph showing the reflection (in %) according to the wavelength (λ, in nm) of the incident radiation.

Example 8

This Example shows how, starting with a first multiple layer structure(#8a), it is possible to improve the optical properties by including anintermediate layer 5 between the second low refraction index layer andthe third high refraction index layer (#8b). It also shows anothermultiple layer structure (#8c) which, without the presence of theintermediate layer 5, has practically the same optical properties. Thestructure #8c fulfils an equivalence relation between the physicalthicknesses and the optical thicknesses of the central triplet in thestructure #8b (intermediate layer of Al₂O₃ and its two adjacent layers)and the doublet in the structure #8c (the second low refraction indexlayer (SiO₂) and the third high refraction index layer (TiO₂)).

#8a #8b #8c SiO₂  84.4 nm  84.4 nm  84.4 nm TiO₂  90.0 nm  90.0 nm  98.4nm Al₂O₃  0.0 nm  34.8 nm  0.0 nm SiO₂ 142.6 nm 142.6 nm 174.2 nm TiO₂122.5 nm 122.5 nm 122.5 nm Base Polymer Polymer Polymer n_(D) = 1.6n_(D) = 1.6 n_(D) = 1.6 RV 15°  1.8% 0.4% 0.5% RV 60° 11.0% 4.8% 5.0% TIR-A 74.7% 72.9% 72.1%  Total thickness 439.6 nm 474.4 nm 479.5 nmThickness of the central triplet 232.6 nm 267.5 nm 272.6 nm Opticalthickness of the central triplet 388.4 nm 445.4 nm 450.6 nm

FIG. 10 shows a graph showing the reflection (in %) according to thewave length (λ, in nm) of the incident radiation for each of the threecases.

Example 9

In this Example, as in Example 8, it shows how, starting with a firstmultiple layer structure (#9a), it is possible to improve the opticalproperties by including an intermediate layer. In this case it is anintermediate layer 6 between the first high refraction index layer andthe second low refraction index layer (#9b). It also shows anothermultiple layer structure (#9c) which, without the presence of theintermediate layer 6, has virtually the same optical properties. Also inthis case the structure #9c fulfils an equivalence relation between thephysical thicknesses and the optical thicknesses of the central tripletin the structure #9b (intermediate layer of Al2O3 and its two adjacentlayers) and the doublet in the structure #9c (the first high refractionindex layer (TiO2) and the second low refraction index layer (SiO2)).

#9a #9b #9c SiO₂  87.7 nm  87.7 nm  87.7 nm TiO₂ 110.8 nm 110.8 nm 110.8nm SiO₂ 148.3 nm 148.3 nm 175.9 nm Al₂O₃  0.0 nm  33.9 nm  0.0 nm TiO₂104.0 nm 104.0 nm 109.7 nm Base Polymer Polymer Polymer n_(D) = 1.6n_(D) = 1.6 n_(D) = 1.6 RV 15° 2.9% 1.0% 1.1% RV 60° 9.7% 4.5% 5.0% TIR-A 74.5%  73.5%  73.0%  Total thickness 450.9 nm 484.8 nm 484.1 nmThickness of the triplet in contact 252.3 nm 286.3 nm 285.6 nm with thebase Optical thickness of the triplet in 424.9 nm 480.4 nm 476.2 nmcontact with the base

FIG. 11 shows a graph showing the reflection (in %) according to thewave length (λ, in nm) of the incident radiation for each of the threecases.

Example 10

In this Example, the multiple layer structure has an interphase (of SiO₂and 15 nm thick), and the third high refraction index layer issub-divided into two sub-layers (one of TiO₂ and one of ZrO₂).

Layer 4 SiO₂ - 62.4 nm Layer 3A-2 ZrO₂ - 50.0 nm Layer 3A-1 TiO₂ - 59.3nm Layer 2B SiO₂ - 175.7 nm Layer 1A TiO₂ - 126.5 nm Interphase SiO₂ -15 nm Base Polymer n_(D) = 1.6 RV 15°  0.9% RV 60°  4.7% T IR-A 72.0%Total thickness 488.9 nm

This solution is a preferable embodiment of the invention.

FIG. 12 shows a graph showing the reflection (in %) according to thewave length (λ, in nm) of the incident radiation.

Examples 11 and 12

In these Examples, as in Examples 8 and 9, it shows how, starting with afirst multiple layer structure (#11a, #12a), it is possible to improvethe optical properties by including an intermediate layer (anintermediate layer 5 in Example 11 and an intermediate layer 6 inExample 12). They are the structures #11 b and #12b, respectively. Theyalso show other multiple layer structures (#11c, #12c) which, withoutthe presence of the intermediate layer 6, has virtually the same opticalproperties. Also in these cases the structures #11c and #12c fulfil anequivalence relation between the physical thicknesses and the opticalthicknesses of the triplet in the structures #11b and #12b and thecorresponding doublets in structures #11c and #12c.

#11a #11b #11c SiO₂  85.0 nm  85.0 nm  85.0 nm TiO₂  95.9 nm  95.9 nm102.0 nm Al₂O₃  0.0 nm  40.7 nm  0.0 nm SiO₂ 127.0 nm 127.0 nm 170.7 nmTiO₂ 124.3 nm 124.3 nm 124.3 nm Base Polymer Polymer Polymer n_(D) = 1.6n_(D) = 1.6 n_(D) = 1.6 RV 15°  3.0% 0.7% 0.6% RV 60° 11.3% 4.5% 4.8% TIR-A 76.0% 73.6%  72.2%  Total thickness 432.2 nm 472.9 nm 481.9 nmThickness of the central triplet 222.9 nm 263.6 nm 272.6 nm Opticalthickness of the central triplet 377.7 nm 444.3 nm 452.9 nm

FIG. 13 shows a graph showing the reflection (in %) according to thewave length (λ, in nm) of the incident radiation for each one of thethree cases in Example 11.

#12a #12b #12c SiO₂  78.5 nm  78.5 nm  78.5 nm TiO₂ 112.1 nm 112.1 nm112.1 nm SiO₂ 127.0 nm 127.0 nm 160.4 nm Al₂O₃  0.0 nm  41.2 nm  0.0 nmTiO₂ 111.3 nm 111.3 nm 122.1 nm Base Polymer Polymer Polymer n_(D) = 1.6n_(D) = 1.6 n_(D) = 1.6 RV 15°  3.7% 1.0% 1.1% RV 60° 10.0% 4.5% 4.7% TIR-A 75.1% 72.9%  71.8%  Total thickness 428.9 nm 470.1 nm 473.1 nmThickness of the triplet in contact 238.3 nm 279.4 nm 282.4 nm with thebase Optical thickness of the triplet in 409.0 nm 476.5 nm 478.9 nmcontact with the base

FIG. 14 shows a graph showing the reflection (in %) according to thewave length (λ, in nm) of the incident radiation for each one of thethree cases in Example 12.

Example 13: Triplet and Doublet High Index Refraction Layers, withoutInterphase and with Residual Reflex Concentrated in the Green Color

-   -   The interphase between the base and the first high refraction        index layer has a thickness of 0 nm, i.e., there is no        interphase layer    -   The first high refraction index layer is a triplet formed by        41.8 nm ZrO₂+92.7 nm TiO₂+28.8 nm ZrO₂ (total 162.9 nm), in this        order, starting from the base    -   The second low refraction index layer is formed by 153.4 nm of        SiO₂    -   The third high refraction index layer is a doublet formed by        15.0 nm ZrO₂+105.1 nm TiO₂    -   The fourth layer is formed by 78.8 nm of SiO₂.

The base has a refraction index of 1.6)

Layer 4 SiO₂ - 78.8 nm Layer 3A-2 TiO₂ - 105.1 nm Layer 3A-1 ZrO₂ - 15.0nm Layer 2B SiO₂ - 153.4 nm Layer 1A-3 ZrO₂ - 28.4 nm Layer 1A-2 TiO₂ -92.7 nm Layer 1A-1 ZrO₂ - 41.8 nm Base Polymer n_(D) = 1.6 RV 15°  0.8%RV 60°  4.6% T IR-A 63.6% Total thickness 515.1 nm

FIG. 15 shows a graph showing the reflection (in %) according to thewave length (λ, in nm) of the incident radiation.

1. A method for manufacturing an ophthalmic lens comprising the stepsof: selecting a base of polymeric material; selecting a coating havingan interferential multiple layer structure, wherein the selecting thecoating includes the steps of— designating a multiple layer structureincluding— an interphase, orientated towards the base and selected fromthe group consisting of SiO_(x), SiO₂, Cr, Ni/Cr, SnO₂, Al₂O₃, AlN, ZnO,SiO/Cr, SiO_(x)/Al₂O₃, ITO, and MoO₃, with a thickness between 0 and 150nm, a first high refraction index layer selected from the groupconsisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn,Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D) higherthan 1.8, a second low refraction index layer selected from the groupconsisting of SiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof, with arefraction index n_(D) lower than 1.65, a third high refraction indexlayer selected from the group consisting of oxides, nitrides andoxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, witha refraction index n_(D) higher than 1.8, a fourth layer selected fromthe group consisting of SiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof,with a refraction index n_(D) lower than 1.8, wherein a total thicknessof said multiple layer structure is at most 600 nm, measured from anouter surface of the interphase to an outer surface of the fourth layer,and wherein, a thickness of said first high refraction index layer isbetween 91 and 169 nm, a thickness of said second low refraction indexlayer is between 128 and 248 nm, a thickness of said third highrefraction index layer is between 73 and 159 nm, and a thickness of saidfourth layer is between 40 and 138 nm; substituting a doublet formed bysaid first high refraction index layer and said second low refractionindex layer with a triplet formed by an intermediate layer, a substitutefirst high refraction index layer and a substitute second low refractionindex layer, wherein said intermediate layer has a refraction index nDlower than 1.8 and with a thickness between greater than 0 and 160 nm,wherein said substitute first high refraction index layer is selectedfrom the group consisting of oxides, nitrides and oxynitrides of Zr, Ti,Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index nDhigher than 1.8, wherein said substitute second low refraction indexlayer is selected from the group consisting of SiO₂, MgF₂, Al₂O₃, LaF₃and mixtures thereof, with a refraction index n_(D) lower than 1.65,wherein a total thickness of said multiple layer structure is at most600 nm, measured from an outer surface of the interphase to an outersurface of the fourth layer, and wherein said triplet has a thicknessthat differs from a thickness of said doublet by less than 5%, and anoptical thickness of said triplet differs from an optical thickness ofsaid doublet by less than 5%; and applying the coating having thesubstituting triplet to said ophthalmic lens.
 2. A method formanufacturing an ophthalmic lens comprising the steps of: selecting abase of polymeric material selecting a coating having an interferentialmultiple layer structure, wherein the selecting the coating includes thesteps of designating a multiple layer structure including— aninterphase, orientated towards the base and selected from the groupconsisting of SiO_(x), SiO₂, Cr, Ni/Cr, SnO₂, Al₂O₃, AlN, ZnO, SiO/Cr,SiO_(x)/Al₂O₃, ITO, and MoO₃, with a thickness between 0 and 150 nm, afirst high refraction index layer selected from the group consisting ofoxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf andmixtures thereof, with a refraction index n_(D) higher than 1.8, asecond low refraction index layer selected from the group consisting ofSiO₂, Mg F₂, Al₂O₃, LaF₃ and mixtures thereof, with a refraction indexn_(D) lower than 1.65, a third high refraction index layer selected fromthe group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb,In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D)higher than 1.8, a fourth layer selected from the group consisting ofSiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof, with a refraction indexn_(D) lower than 1.8, wherein a total thickness of said multiple layerstructure is at most 600 nm, measured from an outer surface of theinterphase to an outer surface of the fourth layer, and wherein, athickness of said first high refraction index layer is between 91 and169 nm, a thickness of said second low refraction index layer is between128 and 248 nm, a thickness of said third high refraction index layer isbetween 73 and 159 nm, and a thickness of said fourth layer is between40 and 138 nm; substituting a doublet formed by said first highrefraction index layer and said second low refraction index layer with atriplet formed by a substitute first high refraction index layer, anintermediate layer and a substitute second low refraction index layer,wherein said intermediate layer has a refraction index n_(D) between1.65 and 1.8 and with a thickness between greater than 0 and 100 nm,wherein said substitute first high refraction index layer is selectedfrom the group consisting of oxides, nitrides and oxynitrides of Zr, Ti,Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction indexn_(D) higher than 1.8, wherein said substitute second low refractionindex layer is selected from the group consisting of SiO₂, MgF₂, Al₂O₃,LaF₃ and mixtures thereof, with a refraction index n_(D) lower than1.65, wherein a total thickness of said multiple layer structure is atmost 600 nm, measured from an outer surface of the interphase to anouter surface of the fourth layer, and wherein said triplet has athickness that differs from a thickness of said doublet by less than 5%,and an optical thickness of said triplet differs from an opticalthickness of said doublet by less than 5%; and applying the coatinghaving the substituting triplet to said ophthalmic lens.
 3. A method formanufacturing an ophthalmic lens, comprising the steps of selecting abase of polymeric material; selecting a coating having an interferentialmultiple layer structure, wherein the selecting the coating includes thesteps of designating a multiple layer structure— an interphase,orientated towards the base and selected from the group consisting ofSiO_(x), SiO₂, Cr, Ni/Cr, SnO₂, Al₂O₃, AlN, ZnO, SiO/Cr, SiO_(x)/Al₂O₃,ITO, and MoO₃, with a thickness between 0 and 150 nm, a first highrefraction index layer selected from the group consisting of oxides,nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixturesthereof, with a refraction index n_(D) higher than 1.8, a second lowrefraction index layer selected from the group consisting of SiO₂, MgF₂,Al₂O₃, LaF₃ and mixtures thereof, with a refraction index n_(D) lowerthan 1.65, a third high refraction index layer selected from the groupconsisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn,Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D) higherthan 1.8, a fourth layer selected from the group consisting of SiO₂,MgF₂, Al₂O₃, LaF₃ and mixtures thereof, with a refraction index n_(D)lower than 1.8, wherein a total thickness of said multiple layerstructure is at most 600 nm, measured from an outer surface of theinterphase to an outer surface of the fourth layer, and wherein, athickness of said first high refraction index layer is between 91 and169 nm, a thickness of said second low refraction index layer is between128 and 248 nm, a thickness of said third high refraction index layer isbetween 73 and 159 nm, and a thickness of said fourth layer is between40 and 138 nm; substituting a doublet formed by said second lowrefraction index layer and said third high refraction index layer with atriplet formed by a substitute second low refraction index layer, anintermediate layer and a substitute third high refraction index layer,wherein said intermediate layer has a refraction index n_(D) between1.65 and 1.8 and with a thickness between 0 and 110 nm, wherein saidsubstitute second low refraction index layer is selected from the groupconsisting of SiO₂, Mg F₂, Al₂O₃, LaF₃ and mixtures thereof, with arefraction index n_(D) lower than 1.65, wherein said substitute thirdhigh refraction index layer is selected from the group consisting ofoxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf andmixtures thereof, with a refraction index n_(D) higher than 1.8, whereina total thickness of said multiple layer structure is at most 600 nm,measured from an outer surface of the interphase to an outer surface ofthe fourth layer, and wherein said triplet has a thickness that differsfrom a thickness of said doublet by less than 5%, and an opticalthickness of said triplet differs from an optical thickness of saiddoublet by less than 5%; and applying said coating with the substitutingtriplet to said ophthalmic lens.
 4. A method for manufacturing anophthalmic lens comprising the steps of: selecting a base of polymericmaterial; selecting a coating having an interferential multiple layerstructure, wherein the selecting the coating includes the steps of—designating a multiple layer structure including— an interphase,orientated towards the base and selected from the group consisting ofSiO_(x), SiO₂, Cr, Ni/Cr, SnO₂, Al₂O₃, AlN, ZnO, SiO/Cr, SiO_(x)/Al₂O₃,ITO, and MoO₃, with a thickness between 0 and 150 nm, a first highrefraction index layer selected from the group consisting of oxides,nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixturesthereof, with a refraction index n_(D) higher than 1.8, a second lowrefraction index layer selected from the group consisting of SiO₂, MgF₂,Al₂O₃, LaF₃ and mixtures thereof, with a refraction index n_(D) lowerthan 1.65, a third high refraction index layer selected from the groupconsisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn,Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D) higherthan 1.8, a fourth layer selected from the group consisting of SiO₂,MgF₂, Al₂O₃, LaF₃ and mixtures thereof, with a refraction index n_(D)lower than 1.8, wherein a total thickness of said multiple layerstructure is at most 600 nm, measured from an outer surface of theinterphase to an outer surface of the fourth layer, and wherein, athickness of said first high refraction index layer is between 91 and169 nm, a thickness of said second low refraction index layer is between128 and 248 nm, a thickness of said third high refraction index layer isbetween 73 and 159 nm, and a thickness of said fourth layer is between40 and 138 nm; substituting a doublet formed by said first highrefraction index layer and said second low refraction index layer with atriplet formed by an intermediate layer, a substitute first highrefraction index layer and a substitute second low refraction indexlayer, wherein said intermediate layer has a refraction index nD lowerthan 1.8 and with a thickness between greater than 0 and 160 nm,substituting a doublet formed by said first high refraction index layerand said second low refraction index layer with a triplet formed by saidsubstitute first high refraction index layer, a second intermediatelayer and said substitute second low refraction index layer, whereinsaid second intermediate layer has a refraction index n_(D) between 1.65and 1.8 and with a thickness between greater than 0 and 100 nm, whereinsaid substitute first high refraction index layer is selected from thegroup consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In,Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D)higher than 1.8, wherein said substitute second low refraction indexlayer is selected from the group consisting of SiO₂, MgF₂, Al₂O₃, LaF₃and mixtures thereof, with a refraction index n_(D) lower than 1.65,wherein a total thickness of said multiple layer structure is at most600 nm, measured from an outer surface of the interphase to an outersurface of the fourth layer, and wherein any of said triplets has athickness that differs from a thickness of said doublet by less than 5%,and an optical thickness of said triplet differs from an opticalthickness of said doublet by less than 5%; and applying the coatinghaving the substituting triplets to said ophthalmic lens.
 5. A methodfor manufacturing an ophthalmic lens comprising the steps of: selectinga base of polymeric material; selecting a coating having aninterferential multiple layer structure, wherein the selecting thecoating includes the steps of— designating a multiple layer structureincluding— an interphase, orientated towards the base and selected fromthe group consisting of SiO_(x), SiO₂, Cr, Ni/Cr, SnO₂, Al₂O₃, AlN, ZnO,SiO/Cr, SiO_(x)/Al₂O₃, ITO, and MoO₃, with a thickness between 0 and 150nm, a first high refraction index layer selected from the groupconsisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn,Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D) higherthan 1.8, a second low refraction index layer selected from the groupconsisting of SiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof, with arefraction index n_(D) lower than 1.65, a third high refraction indexlayer selected from the group consisting of oxides, nitrides andoxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, witha refraction index n_(D) higher than 1.8, a fourth layer selected fromthe group consisting of SiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof,with a refraction index n_(D) lower than 1.8, wherein a total thicknessof said multiple layer structure is at most 600 nm, measured from anouter surface of the interphase to an outer surface of the fourth layer,and wherein, a thickness of said first high refraction index layer isbetween 91 and 169 nm, a thickness of said second low refraction indexlayer is between 128 and 248 nm, a thickness of said third highrefraction index layer is between 73 and 159 nm, and a thickness of saidfourth layer is between 40 and 138 nm; substituting a doublet formed bysaid first high refraction index layer and said second low refractionindex layer with a triplet formed by an intermediate layer, a substitutefirst high refraction index layer and a substitute second low refractionindex layer, wherein said intermediate layer has a refraction index nDlower than 1.8 and with a thickness between greater than 0 and 160 nm,substituting a doublet formed by said second low refraction index layerand said third high refraction index layer with a triplet formed by saidsubstitute second low refraction index layer, a second intermediatelayer and a substitute third high refraction index layer, wherein saidsecond intermediate layer has a refraction index n_(D) between 1.65 and1.8 and with a thickness between greater than 0 and 110 nm, wherein saidsubstitute first high refraction index layer is selected from the groupconsisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn,Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D) higherthan 1.8, wherein said substitute second low refraction index layer isselected from the group consisting of SiO₂, MgF₂, Al₂O₃, LaF₃ andmixtures thereof, with a refraction index n_(p) lower than 1.65, whereinsaid substitute third high refraction index layer is selected from thegroup consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In,Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D)higher than 1.8, wherein a total thickness of said multiple layerstructure is at most 600 nm, measured from an outer surface of theinterphase to an outer surface of the fourth layer, and wherein any ofsaid triplets has a thickness that differs from a thickness of thecorresponding doublet by less than 5%, and an optical thickness of anyof said triplets differs from an optical thickness of the correspondingdoublet by less than 5%; and applying the coating having thesubstituting triplets to said ophthalmic lens.
 6. A method formanufacturing an ophthalmic lens comprising the steps of: selecting abase of polymeric material selecting a coating having an interferentialmultiple layer structure, wherein the selecting the coating includes thesteps of designating a multiple layer structure including— aninterphase, orientated towards the base and selected from the groupconsisting of SiO_(x), SiO₂, Cr, Ni/Cr, SnO₂, Al₂O₃, AlN, ZnO, SiO/Cr,SiO_(x)/Al₂O₃, ITO, and MoO₃, with a thickness between 0 and 150 nm, afirst high refraction index layer selected from the group consisting ofoxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf andmixtures thereof, with a refraction index n_(D) higher than 1.8, asecond low refraction index layer selected from the group consisting ofSiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof, with a refraction indexn_(D) lower than 1.65, a third high refraction index layer selected fromthe group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb,In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D)higher than 1.8, a fourth layer selected from the group consisting ofSiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof, with a refraction indexn_(D) lower than 1.8, wherein a total thickness of said multiple layerstructure is at most 600 nm, measured from an outer surface of theinterphase to an outer surface of the fourth layer, and wherein, athickness of said first high refraction index layer is between 91 and169 nm, a thickness of said second low refraction index layer is between128 and 248 nm, a thickness of said third high refraction index layer isbetween 73 and 159 nm, and a thickness of said fourth layer is between40 and 138 nm; substituting a doublet formed by said first highrefraction index layer and said second low refraction index layer with atriplet formed by a substitute first high refraction index layer, anintermediate layer and a substitute second low refraction index layer,wherein said intermediate layer has a refraction index n_(D) between1.65 and 1.8 and with a thickness between greater than 0 and 100 nm,substituting a doublet formed by said second low refraction index layerand said third high refraction index layer with a triplet formed by saidsubstitute second low refraction index layer, a second intermediatelayer and a substitute third high refraction index layer, wherein saidsecond intermediate layer has a refraction index n_(D) between 1.65 and1.8 and with a thickness between 0 and 110 nm, wherein said substitutefirst high refraction index layer is selected from the group consistingof oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hfand mixtures thereof, with a refraction index n_(D) higher than 1.8,wherein said substitute second low refraction index layer is selectedfrom the group consisting of SiO₂, MgF₂, Al₂O₃, LaF₃ and mixturesthereof, with a refraction index n_(D) lower than 1.65, wherein saidsubstitute third high refraction index layer is selected from the groupconsisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn,Ta, Nb, Hf and mixtures thereof, with a refraction index n_(D) higherthan 1.8, wherein a total thickness of said multiple layer structure isat most 600 nm, measured from an outer surface of the interphase to anouter surface of the fourth layer, and wherein any of said triplets hasa thickness that differs from a thickness of the corresponding doubletby less than 5%, and an optical thickness of any of said tripletsdiffers from an optical thickness of the corresponding doublet by lessthan 5%; and applying the coating having the substituting triplets tosaid ophthalmic lens.
 7. A method for manufacturing an ophthalmic lenscomprising the steps of: selecting a base of polymeric material;selecting a coating having an interferential multiple layer structure,wherein the selecting the coating includes the steps of— designating amultiple layer structure including— an interphase, orientated towardsthe base and selected from the group consisting of SiO_(x), SiO₂, Cr,Ni/Cr, SnO₂, Al₂O₃, AlN, ZnO, SiO/Cr, SiO_(x)/Al₂O₃, ITO, and MoO₃, witha thickness between 0 and 150 nm, a first high refraction index layerselected from the group consisting of oxides, nitrides and oxynitridesof Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with arefraction index n_(D) higher than 1.8, a second low refraction indexlayer selected from the group consisting of SiO₂, MgF₂, Al₂O₃, LaF₃ andmixtures thereof, with a refraction index n_(D) lower than 1.65, a thirdhigh refraction index layer selected from the group consisting ofoxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf andmixtures thereof, with a refraction index n_(D) higher than 1.8, afourth layer selected from the group consisting of SiO₂, MgF₂, Al₂O₃,LaF₃ and mixtures thereof, with a refraction index n_(D) lower than 1.8,wherein a total thickness of said multiple layer structure is at most600 nm, measured from an outer surface of the interphase to an outersurface of the fourth layer, and wherein, a thickness of said first highrefraction index layer is between 91 and 169 nm, a thickness of saidsecond low refraction index layer is between 128 and 248 nm, a thicknessof said third high refraction index layer is between 73 and 159 nm, anda thickness of said fourth layer is between 40 and 138 nm; substitutinga doublet formed by said first high refraction index layer and saidsecond low refraction index layer with a triplet formed by anintermediate layer, a substitute first high refraction index layer and asubstitute second low refraction index layer, wherein said intermediatelayer has a refraction index nD lower than 1.8 and with a thicknessbetween greater than 0 and 160 nm, substituting a doublet formed by saidfirst high refraction index layer and said second low refraction indexlayer with a triplet formed by said substitute first high refractionindex layer, a second intermediate layer and said substitute second lowrefraction index layer, wherein said second intermediate layer has arefraction index n_(D) between 1.65 and 1.8 and with a thickness betweengreater than 0 and 100 nm, substituting a doublet formed by said secondlow refraction index layer and said third high refraction index layerwith a triplet formed by said substitute second low refraction indexlayer, a third intermediate layer and a substitute third high refractionindex layer, wherein said third intermediate layer has a refractionindex n_(D) between 1.65 and 1.8 and with a thickness between 0 and 110nm, wherein said substitute first high refraction index layer isselected from the group consisting of oxides, nitrides and oxynitridesof Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with arefraction index n_(D) higher than 1.8, wherein said substitute secondlow refraction index layer is selected from the group consisting ofSiO₂, MgF₂, Al₂O₃, LaF₃ and mixtures thereof, with a refraction indexn_(D) lower than 1.65, wherein said substitute third high refractionindex layer is selected from the group consisting of oxides, nitridesand oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof,with a refraction index n_(D) higher than 1.8, wherein a total thicknessof said multiple layer structure is at most 600 nm, measured from anouter surface of the interphase to an outer surface of the fourth layer,and wherein any of said triplets has a thickness that differs from athickness of the corresponding doublet by less than 5%, and an opticalthickness of any of said triplets differs from an optical thickness ofthe corresponding doublet by less than 5%; and applying the coatinghaving the substituting triplets to said ophthalmic lens.
 8. The methodaccording to any one of claim 1, 2, 3, 4, 5, 6 or 7, wherein thethickness x of said first high refraction index layer, the thickness yof said second low refraction index layer, the thickness z of said thirdhigh refraction index layer and the thickness t of said fourth layerfulfil the following relation:${\left( {x\mspace{14mu} y\mspace{14mu} z\mspace{14mu} t} \right) - {\left( {129.5\mspace{14mu} 188.3\mspace{14mu} 116.0\mspace{14mu} 89.0} \right) \cdot A \cdot \begin{pmatrix}{x - 129.5} \\{y - 188.3} \\{z - 116.0} \\{t - 89.0}\end{pmatrix}}} \leq 1$ where $A = {\begin{pmatrix}{8.29 \cdot 10^{4}} & {{{- 1.76} \cdot 10^{- 4}},} & {{- 1.18} \cdot 10^{- 4}} & {1.50 \cdot 10^{- 4}} \\{{- 1.76} \cdot 10^{- 4}} & {3.34 \cdot 10^{- 4}} & {{- 1.80} \cdot 10^{- 5}} & {{- 3.50} \cdot 10^{- 5}} \\{{- 1.18} \cdot 10^{- 4}} & {{- 1.80} \cdot 10^{- 5}} & {7.16 \cdot 10^{- 4}} & {{- 2.60} \cdot 10^{- 4}} \\{1.50 \cdot 10^{- 4}} & {{- 3.50} \cdot 10^{- 5}} & {{- 2.60} \cdot 10^{- 4}} & {5.34 \cdot 10^{- 4}}\end{pmatrix}.}$
 9. The method according to any one of claim 1, 2, 3, 4,5, 6 or 7, wherein, the thickness x of said first high refraction indexlayer, the thickness y of said second low refraction layer, thethickness z of said third high refraction index layer and the thicknesst of said fourth layer fulfil the following relation:${\left( {x\mspace{14mu} y\mspace{14mu} z\mspace{14mu} t} \right) - {\left( {129.7\mspace{14mu} 189.7\mspace{14mu} 114.2\mspace{14mu} 87.2} \right) \cdot A \cdot \begin{pmatrix}{x - 129.7} \\{y - 189.7} \\{z - 114.2} \\{t - 87.2}\end{pmatrix}}} \leq 1$ where $A = {\begin{pmatrix}{1.53 \cdot 10^{- 3}} & {{- 3.41} \cdot 10^{- 4}} & {{- 1.35} \cdot 10^{- 4}} & {8.99 \cdot 10^{- 5}} \\{{- 3.41} \cdot 10^{- 4}} & 4.82^{- 4} & {{- 1.86} \cdot 10^{- 5}} & {9.77 \cdot 10^{- 6}} \\{{- 1.35} \cdot 10^{- 4}} & {{- 1.86} \cdot 10^{- 5}} & {1.12 \cdot 10^{- 3}} & {{- 2.53} \cdot 10^{- 4}} \\{8.99 \cdot 10^{- 5}} & {9.77 \cdot 10^{- 6}} & {{- 2.53} \cdot 10^{- 4}} & {8.44 \cdot 10^{- 4}}\end{pmatrix}.}$
 10. The method according to any one of claim 1, 2, 3,4, 5, 6 or 7, wherein a simulation of reflection and transmission curvesof said multiple layer structure has the following characteristics: avisible reflection R_(vis) by a light incidence angle of 15° lower than2.5%, calculated as an average of a reflection value in a range of380-780 nm, weighted by an efficiency spectrum of spectral light for daylight and by a spectral distribution of the illuminant D65, according toSpanish standard UNI-EN ISO 13666:1998, a visible reflection R_(vis) bya light incidence angle of 60° lower than 5.0%, calculated as an averageof a reflection value in a range of 380-780 nm, weighted by anefficiency spectrum of spectral light for day light and by a spectraldistribution of the illuminant D65, according to Spanish standard UNI-ENISO 13666:1998, and a transmission value in the infra-red A T_(IR-A)lower than 76%, calculated as an average transmission value in a rangeof 780-1400 nm according to the following formula:$T_{{IR} - A} = {\sum\limits_{\lambda \in A}\frac{T(\lambda)}{14}}$where  A = {780, 800, 850, 900, 950, 1000, 1050, 1100, 1150, 1200, 1250, 1300, 1350, 1400}.11. The method according to any one of claim 1, 2, 3, 4, 5, 6 or 7,wherein a simulation of reflection and transmission curves of saidmultiple layer structure has a blue light transmittance value T_(azul)lower than 95%, calculated as an average transmission value in a rangeof 410-460 nm according to the following formula:$T_{azul} = {\sum\limits_{\lambda \in B}\frac{T(\lambda)}{6}}$where  B = {410, 420, 430, 440, 450, 460}.
 12. The method according toany one of claim 1, 2, 3, 4, 5, 6 or 7, wherein said fourth layer has arefraction index n_(D) between 1.4 and 1.6 and a thickness between 50and 124 nm.
 13. The method according to claim 1, wherein saidintermediate layer has a thickness between greater than 0 and 25 nm. 14.The method according to any one of claim 1, 2, 3, 4, 5, 6 or 7, whereinat least one of said first high refraction index layer or said thirdhigh refraction index layer is made up of two high refraction indexsub-layers.
 15. The method according to any one of claim 1, 2, 3, 4, 5,6 or 7, wherein at least one of said second low refraction index layeror said fourth layer is made up of two low refraction index sub-layers.